Beyond Lenses: Unlocking the Potential of Digital Holography
for Optical Inspection
Abstract
Optical metrology serves as a cornerstone technology in modern industrial production, playing a crucial role in ensuring the quality and efficiency of products and processes. Currently, we see a trend towards the development of lensless imaging methods in optical metrology, which could lead to a significant departure from traditional lens-based approaches. This development is driven by the recognition of the inherent benefits offered by lensless imaging systems, including compactness, lightweight design, and enhanced flexibility.
In the realm of lensless imaging, digital holography has emerged as a strong contender, offering great advantages, such as compact sensor design, short acquisition times and enhanced depth of focus. Digital holography harnesses the principles of interference and diffraction to capture and reconstruct three-dimensional images of objects with high precision and fidelity. Furthermore, its ability to provide quantitative phase information makes it particularly well-suited for applications in biology and industrial inspection.
In this presentation, I will provide a comprehensive overview over the concept of digital holography with special emphasize on lensless microscopy and its potential for industrial inspection and biological imaging. I will showcase our recent advancements in high-resolution imaging and lensless white light interferometry and provide measurement examples from the fields of biology and wafer level inspection. Furthermore, I will discuss limitations and the future potential of the method, addressing questions surrounding the scalability and performance of lensless imaging systems and microscopes.
Short Biography
Claas Falldorf holds a Ph.D. degree in physics and has over 15 years of expertise in coherent optics. He serves as the head of the Coherent Optics and Nanophotonics Group at the Bremer Institute für angewandte Strahltechnik (BIAS) in Bremen, Germany, and is lecturer at the University of Bremen. One of his primary objectives is to bridge the gap between the latest advancements in optical metrology research and their practical implementation in industry. He authored and coauthored more than 150 publications in areas such as optical metrology, light field synthesis, digital holography, and signal processing, and is co-author of the book 'Digital Holography and Wavefront Sensing', which is considered a standard work in the field of digital holography.
